The AKT-PiVot System 25KPX PVD is specifically engineered to cater to the Gen6 (1500x1850 mm²) LTPS (Low-Temperature Polycrystalline Silicon) and LTPO (Low-Temperature Polycrystalline Oxide) mobile market, focusing on the deposition of critical film layers, such as IGZO (Indium Gallium Zinc Oxide). This system represents a significant advancement in physical vapor deposition (PVD) technology, tailored to meet the demanding requirements of next-generation display manufacturing.

The 25KPX PVD system excels in depositing high-quality IGZO layers, which are essential for the production of advanced displays in mobile devices. IGZO is a key material in the development of high-resolution, low-power consumption displays due to its superior electron mobility and transparency. By precisely controlling the deposition process, the 25KPX system ensures that these films meet stringent uniformity, thickness, and compositional standards required for optimal display performance.