The AKT-PiVot System 25KPX PVD is an advanced physical vapor deposition (PVD) system specifically designed for the Gen6 LTPS (Low-Temperature Polycrystalline Silicon) and LTPO (Low-Temperature Polycrystalline Oxide) mobile market. This system is tailored to deposit critical film layers, such as IGZO (Indium Gallium Zinc Oxide), which are essential for the production of high-performance displays in mobile devices

Key Features and Capabilities

1. Precision Deposition: The 25KPX PVD system offers exceptional precision in the deposition of thin film layers. This is crucial for the formation of IGZO and other complex materials, which require precise control over thickness, uniformity, and composition to achieve optimal electrical and optical properties.

2. Large Substrate Compatibility: Designed to handle Gen6 substrates measuring up to 1500x1850 mm², the AKT-PiVot System 25KPX is ideal for mass production of large-area displays. This capability allows manufacturers to produce larger and higher-resolution screens, meeting the demands of the modern mobile device market